发明名称 SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPLIANCE
摘要 Provided are a semiconductor device with less leakage current is reduced, a semiconductor device with both of high field effect mobility and low leakage current, an electronic appliance with low power consumption, and a manufacturing method of a semiconductor device in which leakage current can be reduced without an increase in the number of masks. The side surface of a semiconductor layer formed of a semiconductor film having high carrier mobility is not in contact with any of a source electrode and a drain electrode. Further, such a transistor structure is formed without an increase in the number of photomasks and can be applied to an electronic appliance.
申请公布号 US2012211809(A1) 申请公布日期 2012.08.23
申请号 US201213397705 申请日期 2012.02.16
申请人 TANAKA TETSUHIRO;TOKUMARU RYO;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA TETSUHIRO;TOKUMARU RYO
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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