发明名称 |
RAW MATERIAL SUPPLY DEVICE AND FILM FORMING APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a raw material supply device capable of forming a thin film consisting of a compound semiconductor on a surface of an object to be processed in a face-up state in a molecular beam epitaxy (MBE) film forming device. <P>SOLUTION: A raw material supply device 62 for supplying raw materials used for manufacturing compound semiconductors comprises: a raw material holder 64 provided on a liquid flow-down surface 90 which extends in a vertical direction and where its outer peripheral surface overflows the liquid; a raw material liquid reservoir 66 provided in the middle in a height direction of the raw material holder and for collecting the raw material liquid as a liquid of the raw material and flowing down the raw material liquid along the liquid flow-down surface 90 by the wettability; and heating means 68 provided in the raw material holder, and for heating the raw material liquid reservoir so that the raw material demonstrates the wettability and heating a tip of the raw material holder to an evaporation temperature of the raw material liquid. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012160585(A) |
申请公布日期 |
2012.08.23 |
申请号 |
JP20110019392 |
申请日期 |
2011.02.01 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
KINOSHITA HIDETOSHI;MORITA YASUSHI |
分类号 |
H01L21/203;C23C14/24;C30B23/08;C30B29/38 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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