ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of reducing generation of scum and giving a pattern excellent in in-plane uniformity of line width (CDU (critical dimension uniformity)), and to provide a resist film and a pattern forming method using the composition.

SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that has a repeating unit represented by general formula (1) and exhibits increase in solubility with an alkali developing solution by an action of an acid; (B) an onium salt compound that has a nitrogen atom in a cationic moiety and is decomposed by irradiation with actinic rays or radiation to generate an acid; and (D) a solvent. A resist film and a pattern forming method using the above composition are also provided.

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