发明名称 |
BORON FILM INTERFACE ENGINEERING |
摘要 |
Methods of depositing boron-containing liner layers on substrates involve the formation of a bilayer including an initiation layer which includes barrier material to inhibit the diffusion of boron from the bilayer into the underlying substrate. |
申请公布号 |
KR20120093139(A) |
申请公布日期 |
2012.08.22 |
申请号 |
KR20127001691 |
申请日期 |
2010.06.15 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BALSEANU MIHAELA;XIA LI QUN;WITTY DEREK R.;CHEN YI |
分类号 |
H01L21/76 |
主分类号 |
H01L21/76 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|