发明名称 BORON FILM INTERFACE ENGINEERING
摘要 Methods of depositing boron-containing liner layers on substrates involve the formation of a bilayer including an initiation layer which includes barrier material to inhibit the diffusion of boron from the bilayer into the underlying substrate.
申请公布号 KR20120093139(A) 申请公布日期 2012.08.22
申请号 KR20127001691 申请日期 2010.06.15
申请人 APPLIED MATERIALS, INC. 发明人 BALSEANU MIHAELA;XIA LI QUN;WITTY DEREK R.;CHEN YI
分类号 H01L21/76 主分类号 H01L21/76
代理机构 代理人
主权项
地址