发明名称 |
RADIATION CURABLE RESIN COMPOSITION, AND FINGERPRINT-RESISTANT RESIN COMPOSITION CONTAINING SAME |
摘要 |
<p>A radiation-curable base resin composition and a fingerprint-resistant resin composition including the same are provided. The radiation-curable base resin composition includes a multifunctional urethane (meth)acrylate having three or more functional groups at 3 to 35 parts by weight, a bifunctional urethane (meth)acrylate at 3 to 35 parts by weight, at least one (meth)acrylic acid ester monomer selected from a monofunctional (meth)acrylic acid ester monomer and a multifunctional (meth)acrylic acid ester monomer at 20 to 60 parts by weight and a radiation polymerization initiator at 0.1 to 15 parts by weight.</p> |
申请公布号 |
EP2489699(A1) |
申请公布日期 |
2012.08.22 |
申请号 |
EP20090850419 |
申请日期 |
2009.10.16 |
申请人 |
POSCO;SAMHWA PAINTSINDUSTRIES CO. LTD. |
发明人 |
KIM, JIN TAE;KWON, MOON JAE;LEE, JAE RYUNG;SONG, HAN SEOB;LEE, YOUNG WOO;BYUN, CHANG SE;KIM, JUNG SU |
分类号 |
C09D175/16;C08F220/18;C09D4/00 |
主分类号 |
C09D175/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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