发明名称 RADIATION CURABLE RESIN COMPOSITION, AND FINGERPRINT-RESISTANT RESIN COMPOSITION CONTAINING SAME
摘要 <p>A radiation-curable base resin composition and a fingerprint-resistant resin composition including the same are provided. The radiation-curable base resin composition includes a multifunctional urethane (meth)acrylate having three or more functional groups at 3 to 35 parts by weight, a bifunctional urethane (meth)acrylate at 3 to 35 parts by weight, at least one (meth)acrylic acid ester monomer selected from a monofunctional (meth)acrylic acid ester monomer and a multifunctional (meth)acrylic acid ester monomer at 20 to 60 parts by weight and a radiation polymerization initiator at 0.1 to 15 parts by weight.</p>
申请公布号 EP2489699(A1) 申请公布日期 2012.08.22
申请号 EP20090850419 申请日期 2009.10.16
申请人 POSCO;SAMHWA PAINTSINDUSTRIES CO. LTD. 发明人 KIM, JIN TAE;KWON, MOON JAE;LEE, JAE RYUNG;SONG, HAN SEOB;LEE, YOUNG WOO;BYUN, CHANG SE;KIM, JUNG SU
分类号 C09D175/16;C08F220/18;C09D4/00 主分类号 C09D175/16
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