| 摘要 |
The device employs an interferometry technique (such as, radiation-superposition shearing interferometry) for measuring the test specimen 1 with double passage, and an object-side measurement structure (items 2,3,4,5,6,8) arranged in the beam path upstream of the test specimen. A reflector 7 element is positioned on a second side of the test specimen opposite the first side for reflecting back through the specimen measurement signals received by the measurement structure. Figure 3 shows an arrangement for parallel imaging aberration determination so that two objective parts (10a,10b) may be measured in parallel and simultaneously.
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