| 摘要 |
PURPOSE: An apparatus and method for processing a substrate are provided to uniformly maintain a temperature of the substrate by correcting a temperature deviation according to an area of the substrate. CONSTITUTION: A processing chamber(110) provides a space to process a substrate and includes a body(120) and a sealing cover(130). The sealing cover seals the inside of the body from the outside by covering an opened upper side of the body. The upper side of the sealing cover is combined with a plasma supply unit(200). An inlet and an induction space to provide plasma to a baffle(190) are formed in the sealing cover. The substrate is loaded on a susceptor(140). A heater(150) heats the susceptor. Temperatures sensors measure temperatures in a first region and a second region of the susceptor. A temperature control member analyzes temperature data and corrects a temperature difference between the first region and the second region.
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