发明名称 Method for the production of an optoelectronic component using thin-film technology
摘要 On an epitaxy substrate (1), a layer structure (5, 6, 7) provided for light-emitting diodes or other optoelectronic components using thin-film technology is produced and provided with a first connecting layer (2), which comprises one or a plurality of solder materials. A second connecting layer (3) is applied over the whole area on a carrier (10) and permanently connected to the first connecting layer (2) by means of a soldering process.
申请公布号 US8247259(B2) 申请公布日期 2012.08.21
申请号 US20080809779 申请日期 2008.11.21
申请人 GROLIER VINCENT;PLOESSL ANDREAS;OSRAM OPTO SEMICONDUCTORS GMBH 发明人 GROLIER VINCENT;PLOESSL ANDREAS
分类号 H01L21/00;H01L33/00 主分类号 H01L21/00
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