发明名称 |
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin |
摘要 |
A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group. |
申请公布号 |
US8247161(B2) |
申请公布日期 |
2012.08.21 |
申请号 |
US20090588117 |
申请日期 |
2009.10.05 |
申请人 |
TAKESHITA MASARU;YOSHII YASUHIRO;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
TAKESHITA MASARU;YOSHII YASUHIRO |
分类号 |
G03F7/039;G03F7/038;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|