| 摘要 |
PURPOSE: A chemical vapor deposition apparatus and a gas supplying unit thereof are provided to enhance the quality of deposited thin films because the temperature of growth environments is accurately controlled by detecting the temperature of a susceptor or a substrate with an optical pyrometer. CONSTITUTION: A chemical vapor deposition apparatus comprises a chamber, a susceptor(20), a process gas supplying part(110), an insertion pipe(120), a sensing pipe(140), a temperature sensing member(150), and a sealing member(160). The susceptor is installed inside the chamber. A substrate is placed on the susceptor. The process gas supplying part is located at the top of the susceptor to supply process gas. The insertion pipe is vertically installed inside the process gas supplying part. The sensing pipe is installed inside the insertion pipe and the upper end thereof is extended to the top of the process gas supplying part. The temperature sensing member measures the temperature of the susceptor or the substrate through the sensing pipe. The sealing member seals a space between the sensing pipe and the insertion pipe.
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