APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

摘要

PURPOSE: An apparatus and method for processing a substrate are provided to efficiently deal with an environment change of a chamber by comparing a reaction current of the chamber with a preset reference reaction current to control a process. CONSTITUTION: A chamber(10) includes a door(12) and an exhaust pipe(14) which exhausts reaction gas. A susceptor(20) is located on the lower side of the chamber and supports a substrate(S). A gas supply pipe(30) supplies reaction gas to the chamber. A shower head(40) faces the susceptor. An RF power source(50) applies RF power to a rear plate(35).