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发明名称
METHOD FOR FORMING HOLLOW PROFILES
摘要
<p>본 발명에 따른 중공 샤프트 형성방법이 개시되며, 중공 프로파일(1)은 다이(3)를 통해 공정 방향(2)으로 안내되고 맨드릴(4)에 의해 고정되어, 다이(3)에서 중공 프로파일(1)은 공정 방향(2)으로 재료 유동 속도(6)를 가지며, 맨드릴(4)은 공정 방향(2)으로 재료 유동 속도(6)보다 큰 드로잉 속도(7)를 갖는다.</p>
申请公布号
KR101175518(B1)
申请公布日期
2012.08.20
申请号
KR20097008120
申请日期
2006.09.22
申请人
发明人
分类号
B21C1/26;B21C3/16;B21K1/12
主分类号
B21C1/26
代理机构
代理人
主权项
地址
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