| 摘要 |
PURPOSE: A film forming device is provided to improve a coating property by preventing processing gases from reacting each other. CONSTITUTION: A first gas injector(51a) includes a gas outlet(52) to supply a first processing gas to a substrate. A second gas injector(51b) supplies a second processing gas which reacts with the first processing gas. A third gas injector(51c) includes a slit(50) which supplies purge gas. An exhaust pipe exhausts an atmosphere in a reaction tube. A control unit outputs a control signal to replace the atmosphere of the reaction tube.
|
