发明名称 STAGE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.
申请公布号 KR20120091478(A) 申请公布日期 2012.08.17
申请号 KR20127020219 申请日期 2004.12.15
申请人 NIKON CORPORATION 发明人 NISHII YASUFUMI;SHIRAISHI KENICHI;KOHNO HIROTAKA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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