发明名称 ULTRATHIN WAFER MICRO-MACHINING METHOD AND SYSTEM BY LASER RAIL-ROADING TECHNIQUE
摘要 PURPOSE: An apparatus and method for finely processing a wafer using a laser rail-roading process are provided to maximize the accuracy and quality of a process by forming or cutting a pattern using multi beams. CONSTITUTION: A light radiating unit(110) radiates multi light beams on the surface of an object(500). The object is arranged on a stage(120) and includes a wafer(510) and a thin film(520). A transfer unit(130) moves the light radiating unit and the stage. A nozzle(140) removes foreign materials and byproducts from the surface of the object.
申请公布号 KR20120090904(A) 申请公布日期 2012.08.17
申请号 KR20120074367 申请日期 2012.07.09
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE 发明人 JEOUNG, SAE CHAE;YAHNG, JI SANG;LEE, HEUNG SOON
分类号 H01L21/301;H01L21/78 主分类号 H01L21/301
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