发明名称 VACUUM HEAT TREATMENT APPARATUS
摘要 PURPOSE: A vacuum-based thermal treating apparatus is provided to implement maintenance for the apparatus by replacing a first filter and/or a second filter. CONSTITUTION: A vacuum-based thermal treating apparatus includes a chamber(10), a reacting container(30), a heating member(40), an exhaust pipe(50), and a filter. The reacting container is positioned in the chamber. The heating member is positioned between the chamber and the reacting container. The heating member heats the reacting container. The exhaust pipe exhausts the inner part of the reacting container. The filter is positioned in the exhaust pipe. The filter includes a first filter(61) at the internal part of the chamber. The filter includes a second filter(62) at the external part of the chamber.
申请公布号 KR20120090499(A) 申请公布日期 2012.08.17
申请号 KR20110010963 申请日期 2011.02.08
申请人 LG INNOTEK CO., LTD. 发明人 KIM, BYUNG SOOK
分类号 B01J3/03;C01B31/36 主分类号 B01J3/03
代理机构 代理人
主权项
地址
您可能感兴趣的专利