| 摘要 |
PURPOSE: A plasma processing apparatus is provided to form uniform field distribution of center and edge portions of a substrate by extending a lower corner portion of a low inductance antenna in a lateral direction. CONSTITUTION: An antenna(200) is combined with a rotation support plate(290) installed on a lead(120). The antenna includes a first antenna load(210) and a second antenna rod(220) which pass through the rotation support plate. A bottom portion of the first antenna load is integrally formed with the first antenna load. The bottom portion of the second antenna rod includes a second antenna load side extension part(221). An antenna connection rod integrally connects the bottom portions of a first antenna load side extension part(211) and the second antenna load side extension part located inside a chamber in a horizontal direction. The first antenna load, the second antenna rod, the first antenna load side extension part, the second antenna load side extension part, and the antenna connection rod are integrally formed. |
