| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new positive resist composition containing a resin having a specified structural unit. <P>SOLUTION: The positive resist composition contains a resin having a structural unit expressed by formula (I) and an acid generator. In the formula, R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>each represent an aliphatic hydrocarbon group, or R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>are bonded with each other to form a ring together with a carbon atom to which they are bonded; R<SP POS="POST">3</SP>represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; T<SP POS="POST">1</SP>represents a divalent aliphatic saturated hydrocarbon group or the like; and m represents an integer of 0 or 1. <P>COPYRIGHT: (C)2012,JPO&INPIT |
