发明名称 |
METHOD FOR FORMING GAPLESS SEMICONDUCTOR THIN FILM |
摘要 |
Provided is a method for forming a gapless semiconductor thin film. The method includes the steps of providing a lead palladium oxide target, arranging the lead palladium oxide target in a vacuum container and providing a substrate, and forming a lead palladium oxide thin film on the substrate using the lead palladium oxide target.
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申请公布号 |
US2012205237(A1) |
申请公布日期 |
2012.08.16 |
申请号 |
US201213346309 |
申请日期 |
2012.01.09 |
申请人 |
JUNG MYUNG-HWA;LEE SUNG-IK;SUNYOUNG LEE |
发明人 |
JUNG MYUNG-HWA;LEE SUNG-IK;SUNYOUNG LEE |
分类号 |
C23C14/34;C23C14/08 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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