LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, METHOD FOR CONTROLLING THE LASER APPARATUS, AND METHOD FOR GENERATING THE EXTREME ULTRAVIOLET LIGHT

摘要

A laser apparatus may include : a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth.