发明名称 |
METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD |
摘要 |
A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure. |
申请公布号 |
US2012206535(A1) |
申请公布日期 |
2012.08.16 |
申请号 |
US201213456977 |
申请日期 |
2012.04.26 |
申请人 |
YAMAMURO JUN;OHSUMI MASAKI;WATANABE MASAHISA;EDAMATSU KEIJI;CANON KABUSHIKI KAISHA |
发明人 |
YAMAMURO JUN;OHSUMI MASAKI;WATANABE MASAHISA;EDAMATSU KEIJI |
分类号 |
B41J2/015 |
主分类号 |
B41J2/015 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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