发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of neutralizing a charged part, occurring in a region of a specimen irradiated with a charged particle beam, at high speed without mounting another device anew on a charged particle beam apparatus. <P>SOLUTION: In a stage after irradiating a charged particle beam for measurement of a specimen before starting next measurement, a retarding voltage and/or an acceleration voltage is adjusted, and the operation is controlled so that neutralization is performed by reducing the difference between the value of the retarding voltage and the value of the acceleration voltage when compared with the difference during measurement. Since a charged part, occurring in a region of a specimen irradiated with a charged particle beam, can be neutralized without mounting another device on a charged particle beam apparatus, neutralization can be carried out without lowering the throughput. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012155980(A) 申请公布日期 2012.08.16
申请号 JP20110013560 申请日期 2011.01.26
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MATSUI HIROYUKI;KOMURO OSAMU;NISHIHARA MAKOTO;TEI TOMOKI
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
代理机构 代理人
主权项
地址