| 摘要 |
PURPOSE: A photo-sensitive resin composition and an insulating film manufactured based on the same are provided to improve the permeability and the flatness of the insulating film. CONSTITUTION: A photo-sensitive resin composition includes a copolymer binder, a quininediazide-based photosensitizer, the mixture of an inorganic material-based curing agent and a polybasic acid-based curing agent, and an organic solvent. The copolymer binder includes unsaturated carboxylic acid monomer, epoxy group containing unsaturated compound monomer, and olefin-based monomer. The unsaturated carboxylic acid monomer is the mixture of one or more selected from a group including acrylic acid, methacrylic acid, crotonic acid, maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, the anhydrides of the fumaric acid, the citraconic acid, the mesaconic acid, the itaconic acid, succinic acid mono(2-(meta)acryloyloxyethyl), phthalic acid mono(2-acryloyloxyethyl), and ω-carboxyl polycaprolactone mono acrylate. |
