| 摘要 |
<p>Provided is an epoch-making deposition apparatus, which can prevent a deposition mask from warping due to heat, and which can perform highly accurate deposition, since a deposition film in a film-forming pattern can be deposited in a wide range using the deposition mask, even a small deposition mask (2), by relatively moving a large substrate (4) with a space between the substrate and the deposition mask, and since the deposition mask (2) can be maintained at a constant temperature by sufficiently suppressing an increase of the temperature of the deposition mask. In the deposition apparatus, the substrate (4) and the deposition mask (2) are disposed with the space therebetween, a mask holder (6) is disposed between the substrate (4) and an evaporation source (1), said mask holder constituting a scatter limiting section that is provided with a limiting opening (5), the deposition mask (2) is attached to the mask holder (6) by bonding the deposition mask to the mask holder, the mask holder (6) is provided with a temperature control mechanism (9) that maintains the temperature of the deposition mask (2), and the highly accurate deposition film in the film-forming pattern can be formed in a range wider than the deposition mask (2) by relatively moving the substrate (4) with respect to the deposition mask (2).</p> |
