发明名称 |
HIGH-PURITY ELECTROLYTIC COPPER AND ELECTROLYTIC REFINING METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electrolytic refining method of high-purity electrolytic copper, by which a S content in precipitated copper can be adjusted to ≤0.01 ppm, even when repeating electrolysis, without requiring any large equipment. <P>SOLUTION: The electrolytic refining method of the high-purity electrolytic copper using an electrolyte comprising a copper nitrate solution comprises: (a) adjusting the sulfur (S) content in the electrolyte to ≤20 ppm; (b) adding polyethylene glycol (PEG) and polyvinyl alcohol (PVA) as additives; and (c) adding chlorine ions and performing electrolysis. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012153975(A) |
申请公布日期 |
2012.08.16 |
申请号 |
JP20110276067 |
申请日期 |
2011.12.16 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
WATANABE MAMI;NAKAYA KIYOTAKA;KATO NAOKI |
分类号 |
C25C1/12;C25C1/00;C25C7/06 |
主分类号 |
C25C1/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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