| 发明名称 |
CLEANING SUBSTRATE AND CLEANING METHOD |
| 摘要 |
A cleaning substrate that can prevent a decrease in the operating rate of a substrate processing apparatus. The cleaning substrate that cleans the interior of a chamber in the substrate processing apparatus has a removal mechanism that removes foreign matter in the chamber. |
| 申请公布号 |
US2012204904(A1) |
申请公布日期 |
2012.08.16 |
| 申请号 |
US201213454695 |
申请日期 |
2012.04.24 |
| 申请人 |
YAMAZAWA YOHEI;NAGAIKE HIROSHI;SAITO MASASHI;HONDA MASANOBU;TOKYO ELECTRON LIMITED |
发明人 |
YAMAZAWA YOHEI;NAGAIKE HIROSHI;SAITO MASASHI;HONDA MASANOBU |
| 分类号 |
B08B9/087 |
主分类号 |
B08B9/087 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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