| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve detection accuracy of systematic defects of a pattern occurring at a low frequency and caused by dimensional failure of a photomask. <P>SOLUTION: A pattern grouping section 16b groups layout patterns based on similarity among the layout patterns. A weighted value setting section 16c sets a weighted value of a group grouped by the pattern grouping section 16b, based on forming difficulty of the layout patterns belonging to the group. A group order calculation section 16e calculates the order of the groups based on the number of layout patterns belonging to the groups and the weighted values of the groups. <P>COPYRIGHT: (C)2012,JPO&INPIT |
