| 摘要 |
PURPOSE: A photo-sensitive resin composition and a light shielding layer using the same are provided to obtain a light shielding layer of superior pattern linearity and resolution. CONSTITUTION: A photo-sensitive resin composition includes photo-polymerizable monomer, a binder resin, a photo-polymerization initiator, a pigment, and a solvent. The photo-polymerizable monomer includes first acryl-based monomer represented by chemical formula 1 and second acryl-based monomer which is different from the first acryl-based monomer. The weight ratio of the first acryl-based monomer and the second acryl-based monomer is 8:2 to 2:8. In chemical formula 1, R1 to R6 are identical or different, hydrogen elements, substituted or non-substituted C1 to C20 alkyl groups, substituted or non-substituted C2 to C20 alkenyl groups, substituted or non-substituted C2 to C20 alkynyl groups, substituted or non-substituted C3 to C30 cycloalkyl groups, substituted or non-substituted C3 to C30 cycloalkenyl groups, substituted or non-substituted C3 to C30 cycloalkynyl groups, substituted or non-substituted C6 to C30 aryl groups, substituted or non-substituted C1 to C20 alkynyl groups, or substituted groups represented by chemical formula 2; and at least one of R1 to R6 is the substituted group represented by chemical formula 2. |
