| 摘要 |
<p>Provided are an exposure device and a substrate holding device that are able to suppress or prevent a substrate from becoming mispositioned and waviness from arising in a substrate held on a base member. The present invention is provided with: a base member (10); a supporting means (20) that operates a plurality of supporting members (21) provided advanceably/retreatabaly from the upper surface of the base member (10); a suction means (30) that operates a plurality of suction elements (31) that are formed on the upper surface of the base member (10); and a control means that, from a state wherein the plurality of support members (21) are uniformly protruded from the upper surface of the base member (10) and a flexible substrate (90) is supported on the uniformly protruded plurality of support members (21), controls the support means (20) in a manner so that the support members (21) are lowered sequentially from the one or plurality of support members (21) near the center of the substrate (90), controls the suction means (30) in a manner so that the suction elements (31) are caused to perform a suction operation sequentially from the one or plurality of suction elements (31) near the center of the substrate (90), thus causing the substrate (90) to be held on the base member (10).</p> |
