| 摘要 |
<P>PROBLEM TO BE SOLVED: To calculate an exact flare value in a short time. <P>SOLUTION: According to an embodiment, there is provided a flare value calculation method. In the flare value calculation method, an average light intensity in the case of performing exposure processing to a substrate using a mask pattern group in which mask patterns created with two or more kinds of sizes are arranged is calculated for every above-mentioned mask pattern. Then, an amount of pattern correction to the mask patterns according to information with regard to the size of the mask patterns and the average light intensity is calculated for every mask pattern. Then, mask patterns after correcting are created for every mask pattern by performing pattern correction to the mask patterns using the amount of the pattern correction for every mask pattern. Then, a flare value of a projection optical system included in an exposure device is calculated using pattern mean density of the mask patterns after correcting. <P>COPYRIGHT: (C)2012,JPO&INPIT |
