发明名称 EXPOSURE DEVICE, METHOD OF MANUFACTURING DEVICE, CLEANING METHOD AND MEMBER FOR CLEANING
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device which can suppress degradation in performance due to contamination. <P>SOLUTION: The exposure device comprises a first member which can form a first immersion space by a liquid for exposure so as to fill the optical path of exposure light with the liquid for exposure, a second member which can form a second immersion space by a liquid for cleaning at a position separated from the first member, and a vibration generator which imparts a vibration to the liquid in the second immersion space. The second immersion space is formed between the second member and a predetermined member facing the second member, and the predetermined member is cleaned by the liquid for cleaning. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012156539(A) 申请公布日期 2012.08.16
申请号 JP20120082595 申请日期 2012.03.30
申请人 NIKON CORP 发明人 NAGASAKA HIROYUKI;FUJIWARA TOMOHARU;HAMAYA MASATO;YODA YASUSHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址