发明名称 VACUUM DEPOSITION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a vacuum deposition apparatus in which a sublimable material set in a crucible used for vacuum vapor deposition is hard to bump. <P>SOLUTION: The vacuum deposition apparatus includes: a vacuum chamber (10); a crucible (11) which is provided in the vacuum chamber (10) and stores a vapor deposition material; and a uniform heating mechanism (20) for heating the vapor deposition material provided in the crucible (11). The uniform heating mechanism (20) has a heater (21) provided around the crucible (11) and a carbon rod (23) provided in the crucible (11). The vapor deposition material (2) is arranged between the crucible (11) and the carbon rod (23), and is nearly uniformly heated by both of the crucible (11) heated by the heater (21) and the carbon rod (23) and is evaporated. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012153923(A) 申请公布日期 2012.08.16
申请号 JP20110012504 申请日期 2011.01.25
申请人 STANLEY ELECTRIC CO LTD 发明人 YOSHIDA MAKOTO;SHINNO CHIKASHI
分类号 C23C14/24 主分类号 C23C14/24
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