| 摘要 |
A vacuum processing system includes a vacuum chamber in connection with a vacuum pump that can exhaust air or vapor in the vacuum chamber, and a container in the vacuum chamber configured to contain one or more work pieces therein and to receive a heat-exchange liquid that comes into contact with the one or more work pieces to allow heat exchange with the one or more work pieces. The vacuum pump can exhaust at least a portion of the vapor evaporated from the heat-exchange liquid on the work pieces or in the container. A deposition source unit can provide material to be deposited on the one or more work pieces in vacuum. The one or more work pieces can be brought a predetermined temperature by the heat-exchange liquid. |
