MASK BLANK FOR FPD DEVICE MANUFACTURE, PHOTOMASK, AND DESIGNING METHOD OF MASK BLANK FOR FPD DEVICE MANUFACTURE

摘要

PROBLEM TO BE SOLVED: To provide a mask blank and a photomask which are suitable to processes (a drawing method and a resist coating method) of a large-sized mask for FPD and different conditions (the kind of resist and resist film thickness).

SOLUTION: There is provided a mask blank for FPD device manufacture which at least has a light shield film on a translucent substrate and is used to form a resist film for laser drawing on the light shielding film by a slit coater device. The light shielding film is controlled to have a width of variation in film surface reflection factor within a range of less than 2% in a wavelength band of 350-450 nm including a laser drawing wavelength. The slit coater device forms the resist film by moving a nozzle, having a resist liquid supply port extending in one direction, relatively to a top surface of the light shielding film in a direction crossing the one direction while discharging the resist liquid from the nozzle.

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