发明名称 |
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND |
摘要 |
A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the base component (A) including a resin component (A1) containing a structural unit (a0-1) having a group represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid. |
申请公布号 |
US2012208128(A1) |
申请公布日期 |
2012.08.16 |
申请号 |
US201213371151 |
申请日期 |
2012.02.10 |
申请人 |
TAKAKI DAICHI;SHIONO DAIJU;ARAI MASATOSHI;IWASHITA JUN;KONNO KENRI;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
TAKAKI DAICHI;SHIONO DAIJU;ARAI MASATOSHI;IWASHITA JUN;KONNO KENRI |
分类号 |
G03F7/20;C08F214/18;C08F228/06;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|