发明名称 PRESSURE SENSOR AND METHOD FOR MANUFACTURING PRESSURE SENSOR
摘要 A pressure sensor 1 comprises a semiconductor substrate 10, insulating layers 21, 22, 23 formed on the semiconductor substrate 10, a semiconductor layer 30 formed on the semiconductor substrate 10 with the insulating layers 21, 23 intervening therebetween, and a cavity portion 13 provided between the semiconductor substrate 10 and the semiconductor layer 30. The portion of the semiconductor layer 30 which overlaps the cavity portion 13 as viewed in a lamination direction serves as a movable portion 31. The cavity portion 13 is surrounded by the insulating layers 22, 23. With this arrangement, the pressure sensor 1 can be manufactured easily with high precision.
申请公布号 US2012205653(A1) 申请公布日期 2012.08.16
申请号 US201013503574 申请日期 2010.11.04
申请人 NISHIKAGE HARUHIKO;FUJITA TOMA;ROHM CO., LTD. 发明人 NISHIKAGE HARUHIKO;FUJITA TOMA
分类号 H01L29/84;H01L21/02 主分类号 H01L29/84
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