发明名称 |
Tools, Methods and Devices for Mitigating Extreme Ultraviolet Optics Contamination |
摘要 |
Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective surface configured to reflect EUV radiation. The method may further include exposing the optically reflective surface to EUV radiation thereby generating electrons. The method may also include applying an electromagnetic field to the optically reflective surface, the electromagnetic field configured to reduce reactions initiated by the electrons on the optically reflective surface. The applied electromagnetic field may be constant or varied and also may have different biases.
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申请公布号 |
US2012205558(A1) |
申请公布日期 |
2012.08.16 |
申请号 |
US201113027804 |
申请日期 |
2011.02.15 |
申请人 |
JINDAL VIBHU;WUEEST ANDREA |
发明人 |
JINDAL VIBHU;WUEEST ANDREA |
分类号 |
H05G2/00;G03B27/32;G03B27/54 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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