| 摘要 |
<p>Magnetron sputtering device (1) comprises a target (2) and a magnetic system (3) that are movable with respect to each other and the magnet system form a magnetic field penetrating the target, for producing rotating race tracks. The magnetic field lines (4) run asymmetrically over a surface of a target material (22) in the reversal region of the race tracks relative to the normal direction of the surface of the target material.</p> |
