发明名称 |
CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN |
摘要 |
<p>This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.</p> |
申请公布号 |
EP2487148(A1) |
申请公布日期 |
2012.08.15 |
申请号 |
EP20100821707 |
申请日期 |
2010.09.27 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
HAYASHI, HIROMI;ECHIGO, MASATOSHI;OGURO, DAI |
分类号 |
C07C39/17;C07C37/20;C08G8/04;G03F7/004;G03F7/038 |
主分类号 |
C07C39/17 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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