发明名称 |
RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY |
摘要 |
<p>Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.</p> |
申请公布号 |
EP1565790(B1) |
申请公布日期 |
2012.08.15 |
申请号 |
EP20030811776 |
申请日期 |
2003.11.28 |
申请人 |
KODAK GRAPHIC COMMUNICATIONS GMBH |
发明人 |
KOTTMAIR, EDUARD;BAUMANN, HARALD;FLUGEL, MICHAEL;DWARS, UDO |
分类号 |
G03F7/029;B41C1/10;B41M5/40;B41M5/46 |
主分类号 |
G03F7/029 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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