发明名称 |
COATING APPARATUS AND COATING METHOD |
摘要 |
<p>The invention is a coating apparatus including: a substrate-holding part that holds a substrate horizontally; a chemical nozzle that supplies a chemical to a central portion of the substrate horizontally held by the substrate-holding part; a rotation mechanism that causes the substrate-holding part to rotate in order to spread out the chemical on a surface of the substrate by a centrifugal force, for coating the whole surface with the chemical; a gas-flow-forming unit that forms a down flow of an atmospheric gas on the surface of the substrate horizontally held by the substrate-holding part; a gas-discharging unit that discharges an atmosphere around the substrate; and a gas nozzle that supplies a laminar-flow-forming gas to the surface of the substrate, the laminar-flow-forming gas having a coefficient of kinematic viscosity larger than that of the atmospheric gas; wherein the atmospheric gas or the laminar-flow-forming gas are supplied to the central portion of the substrate.</p> |
申请公布号 |
EP1975979(B1) |
申请公布日期 |
2012.08.15 |
申请号 |
EP20060834803 |
申请日期 |
2006.12.15 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SAWADA, IKUO;MATSUZAKI, KAZUYOSHI;TANAKA, TAKASHI;IWASHITA, MITSUAKI;MUNAKATA, MIZUE |
分类号 |
H01L21/00;B05C11/06;G03F7/16 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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