发明名称 Compound semiconductor device
摘要 A compound semiconductor device includes: an electron transit layer made of GaN; a channel layer made of AlGaN; a source electrode, a gate electrode and a drain electrode that are provided on the channel layer; a cap layer that is provided at least between the source electrode and the gate electrode and between the gate electrode and the drain electrode and is made of GaN; a recess portion that is provided in the cap layer between the gate electrode and the drain electrode; and a thick portion that is provided in the cap layer between the recess portion and the drain electrode and has a thickness larger than the recess portion.
申请公布号 US8242512(B2) 申请公布日期 2012.08.14
申请号 US20110987426 申请日期 2011.01.10
申请人 YAMAKI FUMIKAZU;INOUE KAZUTAKA;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 YAMAKI FUMIKAZU;INOUE KAZUTAKA
分类号 H01L29/15;H01L31/0312 主分类号 H01L29/15
代理机构 代理人
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