发明名称 Deposition method and manufacturing method of light-emitting device
摘要 An object is to provide a deposition method in which an organic material layer which is a material of a common layer is evenly formed over an entire surface of a donor substrate (a first substrate) and can be transferred to an element formation substrate (a second substrate) as transfer layers which are common layers for red (R), green (G), and blue (B) with different thicknesses. An organic material layer over a first absorption layer and a second absorption layer is deposited to a second substrate as a first transfer layer and a second transfer layer by sublimating the organic material layer over the first substrate. The thicknesses of the first and second transfer layers differ in accordance with the ratio of the area of the first absorption layer to the area of the second absorption layer.
申请公布号 US8241700(B2) 申请公布日期 2012.08.14
申请号 US20090635048 申请日期 2009.12.10
申请人 IKEDA HISAO;TANAKA KOICHIRO;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 IKEDA HISAO;TANAKA KOICHIRO
分类号 B05D5/12;B05D5/00;B05D5/06;B41M3/12;C23C14/30;H05B7/00 主分类号 B05D5/12
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