RESIST STRIPPER COMPOSITION AND METHOD OF STRIPPING RESIST USING THE SAME

摘要

PURPOSE: A resist stripper composition and a method for stripping resist using the same are provided to easily verify the dissolved degree of resist per stripper tank and the replacing timing of the stripper. CONSTITUTION: A resist stripper composition includes 0.1 to 10 weight% of a free radical eliminating agent represented by chemical formula 1, 5 to 30 weight% of a basic compound represented by chemical formula 2, 55 to 94 weight% of a solvent, and 0.01 to 5 weight% of an anticorrosive agent. The solvent includes a protic polar solvent and an aprotic polar solvent. In chemical formula 1, R1 and R2 are respectively C1 to C10 alkyl groups, C2 to C10 alkenyl groups, C1 to C10 hydroxyl alkyl groups, carboxylic groups and hydroxyl group substituted or non-substituted C1 to C10 alkoxy group substituted C1 to C10 alkyl groups, phenyl groups, or benzyl groups. In chemical formula 2, R3, R4, R5 are respectively hydrogen atoms, amino group substituted or non-substituted C1 to C10 alkyl groups, C1 to C4 alkyl group substituted amino group substituted C1 to C10 alkyl groups, C2 to C10 alkenyl groups, C1 to C10 hydroxyl alkyl groups, carboxylic group and hydroxyl group substituted or non-substituted C1 to C10 alkoxy group substituted C1 to C10 alkyl groups, C1 to C4 alkyl group substituted or non-substituted amino groups, phenyl groups, or benzyl groups.