发明名称 |
Lithographic apparatus |
摘要 |
A substrate stage for an immersion type lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate, the substrate stage being constructed to hold the substrate and including at least a sensor for sensing the patterned radiation beam, the sensor including an at least partially transmissive layer having a front side facing the incoming radiation beam and a back side opposite the front side, wherein the back side is provided with at least a sensor mark to be subjected to the radiation beam transmitted through the layer.
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申请公布号 |
US8243259(B2) |
申请公布日期 |
2012.08.14 |
申请号 |
US20090486458 |
申请日期 |
2009.06.17 |
申请人 |
PROSYENTSOV VITALLY;LALBAHADOERSING SANJAYSINGH;MUSA SAMI;LEE HYUN-WOO;ASML NETHERLANDS B.V. |
发明人 |
PROSYENTSOV VITALLY;LALBAHADOERSING SANJAYSINGH;MUSA SAMI;LEE HYUN-WOO |
分类号 |
G01B11/00;G03B27/42;G03B27/54;G03B27/58;G03B27/74 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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