发明名称 Oxide semiconductor and thin film transistor including the same
摘要 An oxide semiconductor and a thin film transistor (TFT) including the same. The oxide semiconductor may be obtained by adding hafnium (Hf) to gallium-indium-zinc oxide (GIZO) and may be used as a channel material of the TFT.
申请公布号 US8242504(B2) 申请公布日期 2012.08.14
申请号 US20090453977 申请日期 2009.05.28
申请人 KIM CHANGJUNG;KIM SANGWOOK;KIM SUNIL;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM CHANGJUNG;KIM SANGWOOK;KIM SUNIL
分类号 H01L29/26 主分类号 H01L29/26
代理机构 代理人
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