A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer ("BCP") material is deposited on the imprinted resist, wherein a molecular dimension Lo of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.
申请公布号
WO2012106121(A2)
申请公布日期
2012.08.09
申请号
WO2012US21781
申请日期
2012.01.18
申请人
SEAGATE TECHNOLOGY LLC;XU, YUAN;LEE, KIM Y.;HU, WEI;WAGO, KOICHI;KUO, DAVID S.;CHAUHAN, SUNDEEP
发明人
XU, YUAN;LEE, KIM Y.;HU, WEI;WAGO, KOICHI;KUO, DAVID S.;CHAUHAN, SUNDEEP