发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMATION OF MICROLENSES
摘要 <p>[Problem] To provide a photosensitive resin composition for the formation of microlenses. [Solution] A photosensitive resin composition for the formation of microlenses, comprising: (A) a copolymer which comprises maleimide structural units represented by formula (1), vinyl ether structural units represented by formula (2), and at least one kind of structural units represented by formula (3), (4) or (5); (B) a photosensitizer; and (C) a crosslinking agent. In the formulae, X is a C1-20 hydrocarbon group which may have either an ether bond or a cyclic structure; Y is an optionally substituted organic group; and Z is an optionally substituted aromatic hydrocarbon group or an alkoxy group.</p>
申请公布号 WO2012105288(A1) 申请公布日期 2012.08.09
申请号 WO2012JP50479 申请日期 2012.01.12
申请人 NISSAN CHEMICAL INDUSTRIES, LTD.;SAKAGUCHI, TAKAHIRO 发明人 SAKAGUCHI, TAKAHIRO
分类号 G02B1/04;C08F212/02;C08F216/14;C08F222/40;C08F232/08;G02B3/00;G03F7/033 主分类号 G02B1/04
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