| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide glass substrate holding means when manufacturing an EUV mask blank, and a method of manufacturing the EUV mask blank using the same. <P>SOLUTION: The substrate holding means is intended to be used with a glass substrate (hereinafter referred to as substrate) at the time of manufacturing a reflection type mask blank for EUVL. It includes an electrostatic chuck part 110 which attracts and holds a part of the rear surface of the substrate, and a pressurizing part 120. A part of a film formation surface side of the substrate is pressurized by the pressurizing part, to pinch the substrate from the film-formation surface side and the rear surface side, for holding as a mechanical chuck. A substrate attraction holding part by the electrostatic chuck and a substrate pressurization part by the mechanical chuck are present outside a quality guaranteed region on the front surface and the rear surface of the substrate. The sum of an attraction holding force for the substrate by the electrostatic chuck and the holding force for the substrate by the mechanical chuck is 200 kgf or larger. The pressurizing force per a unit area for the substrate by the mechanical chuck is 25 kgf/cm<SP POS="POST">2</SP>or less. <P>COPYRIGHT: (C)2012,JPO&INPIT |
