发明名称 LIQUID PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus in which the pipe resistance of pipes connected with nozzles can be reduced even when a nozzle support arm can be rotated about the longitudinal axis thereof, and the space can be saved by reducing the space occupied by the pipes. <P>SOLUTION: In the liquid processing apparatus 10, a nozzle support arm 82 can rotate about the longitudinal axis in the direction of movement of the nozzle support arm 82. The nozzle support arm 82 has pipes 83p-83u for feeding fluid to a nozzle 82a, and the pipes 83p-83u are formed of a flexible material. The pipes 83p-83u are arranged to have a spiral shape on a plane orthogonal to the extending direction of the nozzle support arm 82 at the rear end thereof when the nozzle support arm 82 is located at a retracted position. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012151237(A) 申请公布日期 2012.08.09
申请号 JP20110008064 申请日期 2011.01.18
申请人 TOKYO ELECTRON LTD 发明人 TOJIMA JIRO
分类号 H01L21/304;B05C11/08;G03F7/30;H01L21/027;H01L21/306 主分类号 H01L21/304
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